Jeol IB-09010CP Cross Section Polisher Ion Milling Device

Jeol IB-09010CP Cross Section Polisher Ion Milling Device
Jeol IB-09010CP Cross Section Polisher Argon Beam Milling System
Produces pristine cross sections of samples – hard, soft, or composites without smearing, crumbling,

distorting, or contaminating them in any way.

The ability to create perfect cross sections of paper, shale, yeast, latex beads, coatings, and wire bonds,

or to create a mirrored surface on soft materials such as gold, polymers, ceramics, and glass has greatly

enhanced research and analysis for many of our customers.

The CP uses an argon beam to mill cross sections or polish virtually any material that is affixed to

the continuously rotating sample holder.

The high power optical microscope allows the user to position a sample to within a few microns of the

precise cross section position.

During milling, the sample is rocked automatically to avoid creating beam striations on the cross sectioned surface.

Due to the glancing incidence of the ion beam, argon is not implanted into the sample surface.

100-120V, 50/60Hz, 5A.

Manufacturer Catalogue Information about Jeol IB-09010CP Cross Section Polisher Ion Milling Device :
Features
The IB-09010CP can produce pristine cross sections of specimen that were difficult to handle using a mechanical grinding method. This device is especially suitable for the preparation of cross sections of complex materials in which hard substances and soft substances are intermingled.
The IB-09010CP is an Ion Milling device to perform cross section processing.
A function to automatically start the processing without any waiting time is included. In this way, the process can be started at the optimal vacuum rate.
There is an optional 8kV power supply available, which provides high processing speeds of 300μm/h (on a silicon substrate conversion basis, excrescence quantity : 100μm, 2 hours average)
Easy operation by touch panel

Specifications

Ion accelerating voltage 2 to 6kV(8kV:option)
Ion-beam diameter 500μm or more (full width at half maximum)
Milling speed 100μm/h(average for 2h, accelerating voltage: 6 kV, Si equivalent value, 100 µm or less from edge)
Maximum specimen size 11 mm (W) 10 mm (L) 2mm (T)
20mm(W)×10mm(L)×5mm(T):optional
Specimen movement range X-axis 10 mm Y-axis 3 mm
Specimen-rotation angle adjustment range ±5°
Specimen-milling swing angle ±30°(patent applied for)
Operation Touch panel
Gas Argon (flow rate controlled by mass-flow controller)
Pressure measurement Penning gauge
Main vacuum pump Turbo-molecular pump
Backing pump Rotary pump
Dimensions and masses Basic unit: 545 mm(W)×550 mm(D)×420 mm(H), 64kg
Rotary pump: 150 mm(W)×427 mm(D)×230 mm(H), 16kg
Optional attachments Accelerating Voltage 8 kV Unit
Specimen Rotation Holder
High Positioning Accuracy CCD Camera
Large Specimen Holder

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